Ion-assisted filtered cathodic arc depsotion (IFCAD) system for volume production of thin-film coatings

摘要

An innovative Ion-Assessted Filtered Cathodic Arc Deposition (IFCAD) system has been developed for low temperature, high volume production of thin-film coatings. The FICAD system employs electro-magnetic and mechanical filtering techniques to remove unwanted macro-particles and neutral atoms from the plasma stream. Therefoe, only vions within a defined energy range arrive at the substrate surface, depositing thin-films with excellent mechanical and optical properties. Ion-Assisted-Deposition (IAD) is coupled with Filtered Cathodic Arc (FCA) technology to enhance and modify the arc deposited thin-films. Using an advanced computer controlled plasma beam scanning system, high quality, large area, uniform IFCAD multilayer film structures are attained. Amorphous Diamond-Lie-Carbon (A-DLC) films (up to 85