In theory, the hydration thermodynamics approach used for control of glass production in the Defense Waste Processing Facility should be applicable to virtually any situation in which glass is allowed to react with an aqueous medium. In this paper, the general approach has been modified for application to glass etching by aqueous HF. Using measurements made by Spierings, who etched a wide variety of silicate and borosilicate compositions in 2.9 M HF, excellent agreement is found between the theory and the experimental measurements.
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