首页> 外文会议>International symposium on silicon materials science and technology >IN-SITU OBSERVATION OF DIFFUSION AND SEGREGATION OF Fe ATOMS IN Si CRYSTALS AT HIGH TEMPERATURE BY MOeSSBAUER SPECTROSCOPY
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IN-SITU OBSERVATION OF DIFFUSION AND SEGREGATION OF Fe ATOMS IN Si CRYSTALS AT HIGH TEMPERATURE BY MOeSSBAUER SPECTROSCOPY

机译:Moessbauer光谱法在高温下在高温下的Si晶体中Fe原子扩散和偏析的原位观察

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We perform "high-temperature" Moessbauer experiments on silicon wafers with 30 at. ppm ~(57)Fe in the temperature range from 20°C to 1100°C using an UHV-furnace. Different phases of Fe-silicides such asζ_βand ζ_α-FeSi_2 are identified in the spectra at elevating experimental temperatures. At 1100°C, the precipitates ofζ_α-FeSi_2 dissolve completely, leading to an "Fe solid solution" in Si matrix. This component is tentatively assigned to "substitutional Fe", which performs atomic jumps with the jump frequency of 10~7 s~(-1) at 1000°C, although the concentration of 30 at.ppm Fe is far above the reported solubility.
机译:我们在30 AT上对硅晶片进行“高温”Moessbauer实验。 PPM〜(57)FE在温度范围内的温度范围为20°C至1100°C,使用UHV炉。在升高实验温度的光谱中,在光谱中鉴定出不同硅的Fe-硅化物相。在1100℃下,析出沉淀物,溶解完全溶解,导致Si基质中的“Fe固溶液”。该组分暂时分配到“取代Fe”,其在1000℃下具有10〜7 s〜(-1)的跳跃频率的原子跳,尽管浓度为30.ppm fe远远高于报道的溶解度。

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