首页> 外文会议>International symposium on the science technology of light sources >THE APPLICATION OF ATOMIC FORCE MICROSCOPY TO THE STUDY OD WALL REACTIONS IN HALOGEN LAMPS AND METAL HALIDE DISCHARGE LAMPS
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THE APPLICATION OF ATOMIC FORCE MICROSCOPY TO THE STUDY OD WALL REACTIONS IN HALOGEN LAMPS AND METAL HALIDE DISCHARGE LAMPS

机译:原子力显微镜在卤素灯和金属卤化物放电灯中的研究外壁反应中的应用

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The assessment of the changing envelope topography in an operating lamp is a useful indicator of the processes involved in wall/atmosphere interactions. The use of AFM (Atomic Force Microscopy) has allowed us to make a detailed study of this interface. Use of the Burleigh ARIS 3300 Personal AFM yields resolution of at least 1 nm in the x and y directions and 0.1 nm in the z direction. With resolution at this level extremely subtle changes in wall topography can be detected. Wall degradation can be monitored after very short operation times (minutes) using AFM, thus offering significant reductions in the time necessary to investigate wall reactions compared to other possible diagnostic methods such as light transmission which require lamp operation of thousands of hours.
机译:在操作灯中的改变信封地形的评估是壁/气氛相互作用所涉及的过程的有用指标。使用AFM(原子力显微镜)使我们能够详细研究该界面。使用Burleigh ARIS 3300个人AFM在X和Y方向上产生至少1nm的分辨率和Z方向0.1nm。通过在此级别的分辨率,可以检测到墙上地形的极其微妙的变化。壁降解可以在使用AFM的非常短的操作时间(分钟)之后监测壁降解,从而在研究壁反应的时间内能够显着减少与其他可能的诊断方法(例如需要数千小时的灯操作)。

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