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Electrochemical Study of the Corrosion Behavior of PVD Coatings of Different Microstructure

机译:不同微观结构PVD涂层腐蚀行为的电化学研究

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Titanium, chromium and titanium-chromium alloy coatings were sputter-deposited in order to study their corrosion behavior in relation to microstructure and composition. Alloying of titanium with chromium greatly influences the microstructure of the coatings: alloying led to more dense deposits and in some cases to an X-ray amorphous structure. Alloy coatings showed significantly lower corrosion currents than the constituting metals. Electrochemical impedance spectroscopy (EIS) was used for the estimation of the real surface area of the coatings. When corrected for real surface area, however, the intrinsic corrosion rate of the alloy coatings was found to be comparable to that of the constituting metals. Porosity was found to be strongly influenced by the microstructure: columnar films led to a higher dissolution of the brass substrate through the pores.
机译:钛,铬和铬合金涂层溅射沉积,以研究其与微观结构和组成有关的腐蚀行为。用铬的钛合金极大地影响涂层的微观结构:合金化导致更致密的沉积物,并且在某些情况下对X射线无定形结构。合金涂层显示比构成金属显着降低腐蚀性。电化学阻抗光谱(EIS)用于估计涂层的真实表面积。然而,当校正真实表面积时,发现合金涂层的固有腐蚀速率与构成金属的固有腐蚀速率相当。发现孔隙率受微观结构的强烈影响:柱状膜导致通过孔的溶解较高的黄铜基材。

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