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Concept and Design of the SMART Spectormicroscope at BESSY II

机译:智能展望的概念和设计在Bessy II的

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The concept of a new spectromicroscope (SMART=spectromicroscope for all relevant techniques) currently under construction for an undulator beam line at BESSY II is discussed. The design of the optical system is described as well as the modes of operation and the experiments that can be performed. Monochromatic XUV-radiation (tunable within the energy range 20 to 2000 eV) will be provided by a planegrating monochromator and focussed onto the sample by means of an ellipsoidal mirror. In addition, an electron gun will be installed allowing LEEM, MEM and other forms of microscopy as well as small spot LEED to be performed. With an aberration corrector we expect to achieve a lateral resolution better than 5 nm and to increase considerably the transmission of the optical system compared to previous instruments. An imaging band pass filter corrected to second order will select the energy and the energy band width for the image-forming electrons. The instrument will also allow spectroscopy of photoelectrons from selected small areas of the sample (5-500 nm) with an energy resolution of 0.1 eV.
机译:讨论了当前正在建造在BESSY II下的起伏梁线的新型光谱显微镜(智能= Spectromicroscope)的概念。描述了光学系统的设计以及可以执行的操作模式和实验。单色XUV-辐射(在能量范围内可调谐20至2000V)将由平面单色剂提供,并通过椭圆镜子聚焦在样品上。此外,将安装电子枪,允许leem,mem和其他形式的显微镜以及小点LEED进行。通过像差校正器,我们预计与前一个仪器相比,我们预计比5nm更好地实现优于5nm的横向分辨率,并且显着增加光学系统的传输。校正到二阶的成像带通滤波器将选择成像电子的能量和能带宽。该仪器还将允许光电子的光电子从样品(5-500nm)的选定小区域的光电子,能量分辨率为0.1eV。

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