Pulse duration dependence for laser photothermal imaging media

摘要

Exposure thresholds are measured ror laser photothermal imaging materials, as a function of laser pulse duration in the 30 #mu# s to 1 ps range. The materials studyied were direct writing lithographic printing plates (presstak, Inc.) and ablation transfer imaging films (Lasermask). A thermal conduction model fits the data accurately over this vast range of timeascales, and provides insights into the fundamental mechanisms. The practical implications of mating writing engines to materials with non-reciprocal behavior, where the thresholds decrease with decreasing pulse duration, are discussed briefly.