Plasma flood system for the Precision Implant 9200

摘要

A compact Plasma Flood System (pfs) has been developed for Applied Materials Precision Implant 9000/9200. Operating in the accel/decel mode with 12 mA, 40 keV As+ and 10 mA of BF2+ at 30 keV, the pfs demonstrated 100% yield with 10/sup 6/ antenna MOS capacitors over 6.5 and 10 nm gate oxides. With 0 V guide tube bias, emission current is about 240 mA at 4 A arc. The pfs is easily serviceable, with demonstrated filament life in excess of four weeks.