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Temporal characterization of CMOS circuits by time resolved emission microscopy

机译:时间分辨发射显微镜通过时间分辨率的时间表征CMOS电路

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Directly measures the temporal behavior of fast circuits built from silicon CMOS devices using the hot electron light emission which occurs during switching. The optical technique measures the switching of individual devices separated by as little as 0.5-1.0 micron, with extension to 0.17 micron spacings possible. Temporal resolution is currently 50 psec and improvement to 20 psec is expected. The technique involves no external probes or fabrication of any special test circuits. It simultaneously measures switching waveforms on thousands of devices, giving it a unique ability to efficiently survey large arrays of devices.
机译:直接测量使用在切换期间发生的热电子发射从硅CMOS器件构建的快速电路的时间行为。光学技术测量单独的装置的切换只需几乎0.5-1.0微米,延伸至0.17微米间距。时间分辨率目前是50 psec,预计将改进20 psec。该技术涉及任何特殊测试电路的外部探针或制造。它同时测量成千上万的设备上的切换波形,使其具有有效地调查大型设备阵列的独特能力。

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