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A new YBa_2Cu_3O_(7-δ) thin film patterning technique for use in multilayer structures

机译:一种用于多层结构的新型YBA_2CU_3O_(7-Δ)薄膜图案化技术

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A new patterning technique for YBa_2Cu_3O_(7-δ)(YBCO) thin films has been developed. After deposition of the superconductor a thin (10-20 nm), patterned chromium layer is deposited. During a subsequent anneal step the chromium layer reacts locally with the YBCO to form an insulating Ba-Cr-O compound. By careful optimisation of the parameters during annealing, it is possible to obtain smooth and intrinsically planarised structures. This makes this technique very attractive for multilayer patterning.
机译:已经开发出用于YBA_2CU_3O_(7-Δ)(YBCO)薄膜的新图案化技术。在沉积超导体薄(10-20nm)之后,沉积图案化的铬层。在随后的退火步骤期间,铬层与YBCO在局部反应以形成绝缘的Ba-Cr-O化合物。通过仔细优化退火过程中的参数,可以获得光滑和本质上平坦的结构。这使得这种技术非常有吸引力的多层图案化。

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