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Mismatch Aware Analog Performance Macromodeling using Spline Center and Range Regression on Adaptive Samples

机译:使用样条曲线中心和自适应样品的范围回归不匹配意识的模拟性能宏观调节

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Analog design traditionally relies on designer's knowledge and expertise. Numerous automated synthesis methods have been proposed over the years; they reduce time complexity and explore wider design space. Manufacturing induced defects in the process parameters, render device characteristics inconsistent with their prediced behavior. Device mismatch casues significant variation in analog circuit performance. Monte-carlo simulation is known to be the most accurate method of measuring performance under random variation. But monte-carlo simulation is prohivitively expensive during synthesis process. In this work we present a novel Spline Center and Range Regression (SCRR) technique on adaptive samples to model performance in the presence of process variation. Mismatch aware macromodels can provide considerable speedup during synthesis with minimal loss in accuracy. Experimental results demonstrate the accuracy of the macromodels on an independent validation set using 180nm and 65nm technologies.
机译:模拟设计传统上依靠设计师的知识和专业知识。多年来提出了许多自动化合成方法;他们减少了时间复杂性,探索更广泛的设计空间。制造诱导过程参数中的缺陷,使设备特性与其预测的行为不一致。设备不匹配液体模拟电路性能的显着变化。已知Monte-Carlo仿真是在随机变化下测量性能的最准确的方法。但在合成过程中,Monte-Carlo仿真在昂贵的昂贵。在这项工作中,我们提出了一种新颖的样本和范围回归(SCRR)技术在适应性样本上以在过程变化的存在下进行模拟性能。不匹配感知的Macromodels可以在合成期间提供相当大的加速,精度最小损耗。实验结果展示了Macromodels在使用180nm和65nm技术的独立验证集上的准确性。

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