SiC laminar gratings have been fabricated by reactive ion-beam etching and holographic exposure. Diffraction efficiencies were measured in the region between 17 angstroms and 300 angstroms. The efficiency of the $PLU@1 order was 5 to 20% in this region with a small amount of scattered lights. An irradiation test for the SiC gratings was performed by using intense radiation with a power density of 2.7 W/mm$+2$/ emitted from a multipole wiggler installed into the 2.5 GeV Photon Factory ring. No visible damages and no reduction of the diffraction efficiencies were observed for the uncoated SiC grating after the irradiation, while a remarkable deformation of the deposited Au layer and increase of the scattered light component were observed for the grating coated with Au. In addition to these results, some experimental results of polishability of CVD-SiC are reported.
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机译:通过反应离子束蚀刻和全息暴露制造SiC层光栅。在17埃和300埃之间的区域中测量衍射效率。 $ PLU @ 1订单的效率在该地区的5至20%,散射灯少。通过使用从安装到2.5 GEV Photon工厂环的多极Wiggler的电力密度为2.7W / mm $ + 2 $ /发射的电力密度进行SIC光栅的照射试验。在照射后没有可见损伤并且不会观察到未涂覆的SiC光栅的衍射效率,而沉积的Au层的显着变形并观察到涂有Au的光栅。除了这些结果外,还报道了CVD-SiC抛光的一些实验结果。
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