Contamination control methods-a review of recent progress

摘要

The author reviews a selection of papers from the First International Symposium on Cleaning Technology in Semiconductor Device Manufacturing (held in October 1989) which is applicable to frequency control device processing. The topics of the 43 papers presented included wet cleaning technologies, dry cleaning technologies, particles and airborne contaminants, and the characterization of cleaning. A table of organic contaminants in clean rooms is given. The evolution of particle control requirements is discussed.