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Highly oriented c-axis 23° tilted ZnO films with high quasi-shear mode electromechanical coupling coefficients

机译:高度取向的C轴23°倾斜ZnO膜,具有高准剪切模式机电耦合系数

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A quasi-shear mode piezoelectric film with high electromechanical coupling coefficient k'{sub}15 is attractive for shear wave transducers, shear mode FBAR and SH-SAW devices. The single crystalline ideal ZnO film with c-axis-tilt angle of 28° from the surface normal of the film has high k'{sub}15 value of 0.38. In this study, we have investigated c-axis-tilted ZnO films to obtain sufficient tilt angle and good crystalline alignment using RF magnetron sputtering technique. We focused on the angle between the substrate surface and target surface during the sputtering deposition. In case that the film was deposited on the substrate set at 90° to the target surface, relatively large c-axis tilted angles of 22.6°-26.2° were obtained. Moreover, small ψ-scan FWHM values from 6.7° to 7.8° of the film indicated good crystalline alignment. Finally, k'{sub}15 value of this film was estimated as 0.26, which was the highest value ever reported for c-axis-tilted ZnO or AlN films.
机译:具有高机电耦合系数K'{SUB} 15的准剪切模式压电膜是剪切波传感器,剪切模式FBAR和SH锯装置的吸引力。单晶理想的ZnO膜与C轴 - 倾斜角度为28°的薄膜的表面法线具有高k'{sub} 15值为0.38。在该研究中,我们已经研究了C轴倾斜的ZnO膜以获得使用RF磁控溅射技术获得足够的倾斜角和良好的晶体对准。我们聚焦在溅射沉积期间基板表面和靶表面之间的角度。在将薄膜沉积在90°的基板上沉积到目标表面的情况下,获得的相对大的C轴倾斜角度为22.6°-26.2°。此外,小ψ扫描FWHM值从6.7°到7.8°的薄膜表示良好的结晶取向。最后,估计该薄膜的K'{Sub} 15值为0.26,这是C轴倾斜的ZnO或ALN薄膜报告的最高值。

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