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Fllckcr noise in CMOS: A unlfied model for VLSI processes

机译:CMOS中的FLLCKCR噪声:VLSI进程的UNLFED模型

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Much has appeared in the literature on the sources of flicker noise, or 1/f noise, in MOSFETs.1,2,3 This is often [he dominant noise when MOSFETs are used to design sensitive amplifiers. However, there is very little agreement on the physical mechanisms responsible for this noise, and there are no widely accepted quantitative models for it. Of the theories, most widely held is the carrier density fluctuation model, which accounts for the noise being produced by random trapping and de-trapping of the carriers in the inversion layer by traps in the gate oxide. There is another empirically based hypothesis, the mobility fluctuation model, whose foundation lies in the observation of flicker noise in bulk resistors, that has also been suggested to account for the noise mechanism.2
机译:在闪烁噪声的源或1 / f噪声的文献中出现了很多,在MOSFET中,如MOSFET.1,2,3这通常是[他在使用MOSFET设计敏感放大器时的主导噪音。但是,对负责这种噪音的物理机制非常吻合,并且没有广泛接受的定量模型。在理论中,最广泛保持的是载流子密度波动模型,其通过在栅极氧化物中通过陷阱随机捕获和去捕获载波的载流子来捕获噪声。还有另一个基于凭证的假设,移动波动模型,其基础在于散装电阻中的闪烁噪声观察,这也提出了噪声机制。

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