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High-frequency Response of Si-SET: Experimental Verification

机译:Si-Set的高频响应:实验验证

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It has been observed that there is no upper limit offrequency in the rectifying operation ofsingle-electron transistors (SETs). Theoreticalexplanation behind this is that the asymmetry inthe tunneling rate with respect to drain voltage isresponsible for asymmetry in the drain current,resulting in rectification even at higher frequencybeyond the conventional cutoff frequency. Here,the details of ongoing experimental verification arereported.Devices under consideration are i) SET by PADOXmethod (Fig. 1), and ii) heavily doped Sinanowire-base SET (Fig. 2). In addition, referenceSchottky barrier diode is used to calibrate themeasurement system. Frequency response of SETplaced inside the low-temperature (LT) chamber ismeasured by applying high-frequency signal fromAgilent N5181A signal generator (100 kHz ~ 3GHz) to the drain terminal via GSG probe and 6dBattenuator for providing DC return path (Fig. 3).
机译:已经观察到没有上限频率在整流操作中单电子晶体管(组)。理论上背后的解释是不对称相对于漏极电压的隧道速率是负责排水电流的不对称,即使在较高频率下也导致整改超出传统的截止频率。这里,正在进行的实验验证的细节是报道。正在考虑的设备是i)由Padox设置方法(图1),和II)严重掺杂Si纳米线底座(图2)。另外,参考肖特基势垒二极管用于校准测量系统。集合的频率响应放置在低温(LT)室内通过施加高频信号来测量Agilent N5181A信号发生器(100 kHz〜3GHz)通过GSG探针和6dB到排水末端用于提供DC返回路径的衰减器(图3)。

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