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Study on low temperature welding of needle like copper based micro nano array materials and tin based solder

机译:铜基微纳米阵列材料低温焊接及基锡焊料研究

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A surface needle like copper based micro nano array material structure was prepared by electroless plating. The copper needle array layer height was 1–3 μm, and the root diameter was 1–2 μm. This structure has been applied to Cu and tin based solder interconnects at low temperature and solid state. The strength, microstructure, chemical composition and shear strength of the interconnection interface were analyzed by scanning electron microscope, transmission electron microscope and welding strength testing instrument. Due to the mechanical interlocking force produced by needle like material structure and the formation of intermetallic compounds by solid atom diffusion, the interconnection quality is excellent.
机译:通过无电镀制备诸如铜基的微纳米阵列材料结构等表面针。铜针阵列高度为1-3μm,根直径为1-2μm。该结构已应用于低温和固态的Cu和基锡焊料互连。通过扫描电子显微镜,透射电子显微镜和焊接强度试验仪分析互连界面的强度,微观结构,化学成分和剪切强度。由于针状物质结构产生的机械互锁力和通过固体原子扩散形成金属间化合物,互连质量是优异的。

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