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Simultaneous measuring the resistivity and permeability of a filmsample with double coils

机译:同时测量薄膜的电阻率和磁导率双线圈样品

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摘要

A method is proposed for a simultaneous measurement of theresistivity and permeability of a film by measuring the difference inthe composite impedance of a pair of coils placed on both sides of thesample film facing each other. In first case, the current passes throughthe coils in the same direction and in second case, the current passesthrough the coils in opposite directions to each other. It wastheoretically found that the optimum frequency for the measurement wasproportional to the resistivity and inversely proportional to thethickness of a sample film in the case of paramagnetic films. Thismethod was tested by measuring the resistivity of copper and brass filmsof a thickness ranging from 0.01 to 0.08 mm, and by simultaneouslymeasuring the resistivity and permeability of nickel films of athickness of 0.01 and 0.02 mm. The measured values of the resistivitywith this method have correlated well with the values measured with thedc four-point probe method
机译:提出了一种用于同时测量的方法 通过测量差异的膜的电阻率和渗透性 一对线圈的复合阻抗放在两侧 样品膜彼此面对。在第一种情况下,电流通过 线圈在相同方向和第二种情况下,电流通过 通过彼此相反方向的线圈。它是 理论上发现测量的最佳频率是 与电阻率成比例并与之成反比 在顺磁膜的情况下,样品膜的厚度。这 通过测量铜和黄铜膜的电阻率来测试方法 厚度范围为0.01至0.08 mm,同时 测量镍膜​​的电阻率和渗透率 厚度为0.01和0.02 mm。电阻率的测量值 通过这种方法与测量值良好相关 直流四点探针方法

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