Computing Fréchet Distance Metric Based L-Shape Tile Decomposition for E-Beam Lithography

摘要

A Basic step in mask data preparation is layout decomposition. This is also a fundamental step in e-beam lithography (EBL) writing. To achieve better throughput in EBL - shape writing technique has been adopted. It is termed as L-shape fracturing by keeping similarity with rectangular fracturing. While implementing this new technique, a very thinarrow feature is being generated termed as sliver. To achieve better manufacturability, proper methodology needs to be developed for minimization of sliver. This paper proposes a framework for L-shape fracturing with map matching with respect to Fréchet distance metrics. The framework starts with finding out concave vertices for a given layout as input. It then proceeds to next level by computing most densely populated concave points with a goal to form balanced partition of concave points of the given layout. In the subsequent steps, Fréchet distance based layout fracturing is finally accomplished. In this paper a heuristic function is proposed for sliver minimization as well as generation of L-shape features.