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A 512-kb 1-GHz 28-nm partially write-assisted dual-port SRAM with self-adjustable negative bias bitline

机译:具有自可调负偏置位线的512-kb 1-GHz 28-nm部分写入辅助双端口SRAM

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We propose a partially write-assisted two read/write dual-port (DP) SRAM in 28-nm technology. Our write-assist circuit with metal-coupled capacitance can generate negative bitline bias which is flexibly adjustable to any bit-word configurations. By effectively applying assist biases only to sub-blocks with margin-less bits, power overhead can be reduced with Vmin improved. A test chip including proposed 512-kb DP SRAM macro is designed using 28-nm HKMG technology, from which we successfully observed 1-GHz operation at 1.0 V, 190 mV Vmin improvement, and 21% power reduction compared to a conventional assist.
机译:我们提出了一种采用28nm技术的部分写辅助的两个读/写双端口(DP)SRAM。我们的具有金属耦合电容的写辅助电路会产生负的位线偏置,可以灵活地调整为任何位字配置。通过仅对具有无余量比特的子块有效地施加辅助偏置,可以在改善Vmin的情况下减少功率开销。使用28 nm HKMG技术设计了包括建议的512-kb DP SRAM宏的测试芯片,通过该芯片,我们成功地观察到1.0 GHz时1 GHz的工作频率,190 mV Vmin的改进以及与传统辅助器件相比功耗的降低21%。

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