首页> 外文会议>Integrated Optics and Optical Fibre Communications, 11th International Conference on, and 23rd European Conference on Optical Communications (Conf. Publ. No.: 448) >The effects of phase steps in e-beam written phase-masks used for fibre grating fabrication by near-field holography
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The effects of phase steps in e-beam written phase-masks used for fibre grating fabrication by near-field holography

机译:在近场全息术中用于制造光纤光栅的电子束相位掩膜中相位台阶的影响

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摘要

We report analysis and experimental results on the effects that intentional or unintentional phase steps in e-beam written phase-masks have on in-fibre Bragg gratings written using near-field holography.
机译:我们报告分析和实验结果,说明电子束书面相位掩模中有意或无意相位步长对使用近场全息术写入的光纤布拉格光栅的影响。

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