High-laser-damage-threshold HfO2/SiO2 mirrors manufactured by sputtering process

机译：通过溅射工艺制造的高激光损伤阈值HfO2 / SiO2反射镜

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Abstract: A major preoccupation for the design of the LMJ laser is the mirrors laser damage threshold. SAGEM SA, in collaboration with the CEA, has conducted a study in order to improve the laser induced damage threshold under operational conditions. !0

机译：摘要：LMJ激光器的主要设计重点是反射镜激光器的损伤阈值。 SAGEM SA与CEA合作进行了一项研究，目的是在操作条件下提高激光诱导的损伤阈值。！0

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《Third International Conference on Solid State Lasers for Application to Inertial Confinement Fusion》||p.912-920|共9页
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Anne Fornier; Ctr. dEtudes de Limeil-Valenton/CEA; Villnve St. Grges Cdx; France; D.Bernardino; Ctr. dEtudes de Limeil-Valenton/CEA; Villeneuve; France; Odile Lam; Ctr. dEtudes de Limeil-Valenton/CEA; Villeneuve St. Georges; France; J.Neauport; Ctr. dEtudes de Limeil-Valenton/CEA; St Georges Cedex; France; F.Dufour; SAGEM SA; Argenteiul Cedex; France; Bernard Schmitt; SAGEM SA; Argenteuil; France; Jean-Marie Mackowski; Univ. Claude Bernard; Villeurbanne Cedex; France.;
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中图分类光电子技术、激光技术;
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1. Study on Laser Conditioning Parameters of HfO2/SiO2 Mul tilayer Mirrors [J] . Fu Dai, Wenqing Shi, Baojian Yang, Advances in Materials Physics and Chemistry . 2017,第6期

机译：HfO2 / SiO2多层镜的激光调理参数研究
2. Annealing effects on microstructure and laser-induced damage threshold of HfO2/SiO2 multilayer mirrors [J] . Jena Shuvendu, Tokas Raj Bahadur, Rao K. Divakar, Applied optics . 2016,第22期

机译：退火对HfO2 / SiO2多层反射镜微观结构和激光损伤阈值的影响
3. Sub-250 nm low-threshold deep-ultraviolet AlGaN-based heterostructure laser employing HfO2/SiO2 dielectric mirrors [J] . Kao Tsung-Ting, Liu Yuh-Shiuan, Mahbub Satter Md., Applied Physics Letters . 2013,第21期

机译：使用HfO2 / SiO2介电镜的亚250nm低阈值深紫外AlGaN基异质结构激光器
4. High-laser-damage-threshold HfO2/SiO2 mirrors manufactured by sputtering process [C] . Anne Fornier, D.Bernardino, Odile Lam, International conference on solid state lasers for application to inertial confinement fusion . 1999

机译：通过溅射工艺制造的高激光损坏阈值HFO2 / SiO2镜子
5. A study of the influence of process parameter variations on the material properties and laser damage performance of ion beam sputtered Sc2O3 and HfO2 thin films. [D] . Langston, Peter F. 2016

机译：研究工艺参数变化对离子束溅射Sc2O3和HfO2薄膜的材料性能和激光损伤性能的影响。
6. Interfacial Electrical and Band Alignment Characteristics of HfO2/Ge Stacks with In Situ-Formed SiO2 Interlayer by Plasma-Enhanced Atomic Layer Deposition [O] . Yan-Qiang Cao, Bing Wu, Di Wu, 2017

机译：等离子体增强原子层沉积法原位形成SiO2中间层的HfO2 / Ge叠层的界面电和能带对准特性
7. High laser damage threshold $HfO_{2}/SiO_{2}$ mirrors manufactured by sputtering process [O] . Fornier, A, Bernardino, D, Iam, O, 1998

机译：通过溅射工艺制造的高激光损伤阈值$ HfO_ {2} / SiO_ {2} $反射镜

High-laser-damage-threshold HfO2/SiO2 mirrors manufactured by sputtering process

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