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Design, installation and performance of the new insulator for NSTX CHI experiments

机译:用于NSTX CHI实验的新型绝缘子的设计,安装和性能

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Coaxial Helicity Injection (CHI), a non-inductive method to initiate plasma and generate toroidal plasma current, is being investigated in the National Spherical Torus Experiment (NSTX). The center stack and outer vacuum vessel are separated by insulating gaps at the top and bottom of the slim central column so that a high voltage (up to 2 kV) can be applied between them from a pulsed power supply or a capacitor bank to initiate an arc discharge. In the presence of a suitable poloidal magnetic field, the discharge is initiated at the lower gap (the injector gap) and because of the strong toroidal field develops a helical structure resulting in substantial toroidal plasma current being driven. In NSTX, up to 390 kA of toroidal current has been generated for an injected current of 25 kA. The early investigations of CHI however frequently developed arcs across the insulator at the top of the machine (the absorber gap), which terminated the desired discharge. This arcing greatly restricted the operational space available for CHI studies. During 2002, the absorber region was modified to suppress these arcs. The new design includes a new ceramic insulator on the high field side of the absorber region with a much longer tracking distance between conducting elements at the different potentials. Furthermore, two new coils were installed near the absorber to provide the ability to minimize the poloidal field connecting the center stack and outer vacuum vessel. During the subsequent experimental campaign, CHI operation was less prone to arcing in the absorber and those arcs that did occur did not terminate the main discharge
机译:美国国家球形圆环实验(NSTX)正在研究同轴螺旋注射(CHI),一种非感应方法来引发等离子体并产生环形等离子体电流。中心堆和外部真空容器由细长的中心柱顶部和底部的绝缘间隙隔开,以便可以从脉冲电源或电容器组之间施加高压(最高2 kV),以启动电弧放电。在存在合适的极向磁场的情况下,放电在较低的间隙(喷射器间隙)处开始,并且由于强的环形场而形成螺旋结构,从而导致驱动大量的环形等离子体电流。在NSTX中,对于25 kA的注入电流,已经产生了高达390 kA的环形电流。但是,对CHI的早期研究经常在机器顶部的绝缘子(吸收器间隙)上形成电弧,从而终止了所需的放电。这种电弧极大地限制了CHI研究的可用操作空间。在2002年期间,对吸收体区域进行了修改以抑制这些电弧。新设计在吸收器区域的高电场侧包括一个新的陶瓷绝缘体,在不同电势下,导电元件之间的走线距离更长。此外,在吸收器附近安装了两个新的线圈,以提供最小化连接中心烟囱和外部真空容器的极场的能力。在随后的实验活动中,CHI操作不太容易在吸收塔中产生电弧,并且那些确实发生的电弧并未终止主放电

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