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Technology/strategy management issues for semiconductor technology

机译:半导体技术的技术/战略管理问题

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For more than forty years continuous improvements in semiconductortechnology have driven major performance and value for moneyimprovements into a broad range of industries. In particular both soldstate memory and microprocessors have been major benefactors from designand process improvements and contributors to this widespread success andpenetration of microelectronics into our lives. The resulting smallerdevice dimensions and larger semiconductor wafers have produced theperformance benefits. The rate of device dimension reduction seems to bedecreasing as we approach the 0.10 to 0.25 micron range, with capitalinvestments approaching $1 billion dollars per facility for the 200 mmwafers increasingly coming into use. Some industry leaders forecast a $2billion dollar next generation manufacturing facility cost as weapproach the year 2000. These challenges threaten the continuedexpectation of device cost reduction and may herald the maturation (end)of the optical lithography technology based S-curve “family”progress, or change the size and/or scope of the wafer manufacturingfacility need to achieve good economics. This summary paper highlightsissues, trends, industry activities and needs
机译:超过四十年的半导体连续改进 技术推动了主要的性能和价值 改善了广泛的行业。特别是卖掉了 状态记忆和微处理器是设计的主要福利商 并对这一广泛成功的过程改进和贡献者 微电子学渗透到我们的生活中。由此产生的更小 设备尺寸和较大的半导体晶片制作了 性能效益。设备尺寸减少率似乎是 随着我们接近0.10至0.25微米的范围,随着资本,减少 投资接近200毫米的每设施10亿美元 薄饼越来越进入使用。一些行业领导者预测2美元 十亿美元的下一代制造厂花费我们 接近2000年。这些挑战威胁着继续 预期设备成本降低,可能预示成熟(结束) 基于光学光刻技术的S曲线“家庭” 进度,或改变晶片制造的尺寸和/或范围 设施需要实现良好的经济学。这个摘要纸亮点 问题,趋势,行业活动和需求

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