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Absorption of NiCr and Cr Films in the Millimeter Wavelength Range

机译:毫米波波长范围内NiCr和Cr膜的吸收

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This paper describes the technology for manufacturing nichrome and chromium films on mica substrates by thermal vacuum deposition. The thickness of these films controlled by a resistive method, which ensures the production of films with a thickness of ~10 nm. Experimental results of the study of absorption of film structures of nichrome-mica, chromium-mica in the frequency range of 75–260 GHz on the installation consisting of a vector analyzer of electrical circuits R&SZVA-40 by Rohde&Schwarz with the measuring channels. The dependence of the absorption coefficient of nichrome and chromium films at the level of 0.5 in the frequency ranges 102–110 GHz, 206.6-223.6 GHz and 102-116,6 GHz, 206-226,6 GHz, respectively, is obtained. It is advisable to use films as a millimeter radiation absorber.
机译:本文介绍了通过热真空沉积在云母基板上制造镍铬合金和铬膜的技术。这些膜的厚度通过电阻法控制,可确保生产约10 nm的膜。在由Rohde&Schwarz的R&SZVA-40电路矢量分析仪和测量通道组成的装置上,研究了在75–260 GHz频率范围内吸收镍铬云母,铬云母膜结构的实验结果。分别获得了在102-110 GHz,206.6-223.6 GHz和102-116,6 GHz,206-226,6 GHz频率范围内0.5级镍铬合金和铬薄膜的吸收系数的依赖性。建议使用薄膜作为毫米波辐射吸收剂。

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