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Free-Space Permittivity Measurement for Inhomogeneous PSV-Coated Si-wafer at Frequencies from 75 GHz to 325 GHz

机译:在75 GHz至325 GHz频率下非均匀PSV涂层Si晶片的自由空间介电常数测量

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摘要

A method to extract dielectric property of inhomogeneous PSV (Passivation)-coated Si-wafer is presented at broadband frequencies from 75 GHz to 325 GHz. Free-space measurement using continuous wave (CW) system is carried out. Numerical iterative algorithm is employed to extract permittivity from complex scattering parameters. Due to scarcity of related previous studies beyond 100 GHz, the discussions on parameters that may affect the results are also described in detail. The calculated permittivity based on the proposed method highly correlates with the analytical values.
机译:在75 GHz至325 GHz的宽带频率下,提出了一种提取非均质PSV(钝化)涂层硅晶片介电特性的方法。使用连续波(CW)系统进行自由空间测量。采用数值迭代算法从复杂的散射参数中提取介电常数。由于先前有关100 GHz以上的研究缺乏,因此还将详细讨论可能影响结果的参数。基于所提出的方法计算出的介电常数与分析值高度相关。

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