Tunable Bandwidth for Application-specific SAxP process enhancement

摘要

Use of ArFi lithography requires application-specific tuning to maximize patterning process windows. Previous investigations into the effects of light source bandwidth on imaging performance have provided the foundation for this work by identifying significant improvements in Exposure Latitude for reduced sensitivity to dose variations. This study will focus on the increase in image contrast that 200 fm light source E95 bandwidth enables on Self-Aligned Quadruple Patterning (SAQP) and Self-Aligned Double Patterning (SADP) core features. Focus of our investigation will be the understanding of roughness and profile variation through different exposure conditions.