Stress State in Cr Coatings During Deposition and Post-Deposition Ageing and Annealing

摘要

1. Same conditions leading to Cr(OH)_3 incorporation are responsible for H_2 evolution and incorporation. These are low values of current efficiency leading to a high interfacial pH values and very negative rest potential of electrode surface during Cr(lll) electroreduction leading to a water reduction and generation of large quantities of H_2/ H~* at the interface.