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Industrialization progress of high-purity hafnium for optical components

机译:光学元件用高纯的产业化进展

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Hafnium oxide, hafnium crystal bar and high-purity hafnium were prepared using extraction separation, reduction, electrolytic refining, iodide refining and electron beam melting process by General Research Institute for Nonferrous Metals. A hundreds-kilogram production line has been built. The purity of the high-purity hafnium was Zr/(Zr+Hf) <0.3wt% and Zr+Hf>99.99wt%, which enables a high laser induced damage threshold.
机译:通过有色金属研究所的萃取分离,还原,电解精炼,碘化物精炼和电子束熔化工艺制备了氧化f,crystal晶棒和高纯ha。一条百公斤的生产线已经建成。高纯度ha的纯度为Zr /(Zr + Hf)<0.3wt%和Zr + Hf> 99.99wt%,从而可以实现较高的激光诱导损伤阈值。

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