New titanium, zirconium and hafnium alkenoxides useful for forming thin films, e.g. on electronic or optical components

摘要

Titanium, zirconium and hafnium alkenoxides (I) are new. Metal alkenoxides of formula (I) are new. M(OR) 4 (I) R : 2-propen-1-yl, 1-methyl-2-propen-1-yl or 1,1-dimethyl-2-propen-1-yl. Independent claims are also included for: (1) material (M1) for forming a thin film, comprising a compound (I); (2) producing a thin film by vaporizing M1 over a substrate to form a (I)-containing vapor and forming a thin film on the substrate by decomposing (I) or subjecting (I) to a chemical reaction; (3) producing a thin film by vaporizing M1 over a substrate to form a (I)-containing vapor and forming a thin metal oxide film on the substrate by decomposing (I) or subjecting (I) to a chemical reaction in the presence of a reactive gas containing oxygen or ozone; (4) thin film produced as above.