Lab- and field-test results of MFIG, the first real-time vacuum-contamination sensor

摘要

To produce high-end semiconductor products, clean vacuum is often required. Even small amounts of high-mass molecules can reduce product yield. The challenge is to timely detect the presence of relevant contaminants. This is where MFIG can help. The mass-filtered ion gauge sensor (MFIG) continuously and selectively monitors the presence of high-mass contaminant molecules with a sensitivity down to 1E-13 mbar at total pressures up to 1E-5 mbar. This contribution presents laboratory and field-test data to demonstrate the capabilities of the latest version of the MFIG sensor in continuously and selectively detecting high-mass contaminant molecules in (U)HV vacuum.