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Fabrication and evaluation of aluminum nano-wire grid polarizer array in two different structure types

机译:两种不同结构类型的铝纳米线栅偏光片阵列的制作与评价

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Aluminum nano-wire grid structure based on stokes vector plays an important role in the polarization application technology. In this paper, we present the methods of fabricating aluminum nano-wire grid in a single direction structure and a four-orientation structure using EBL (electron beam lithography) and ICP-RIE (inductively coupled plasma-reactive ion etching). According to the request of visible light polarization, the grating's period was designed to 200nm. Based on the experimental measurement and simulation analysis, the extinction ratio of single direction nano-wire grid structure is higher than multi-orientation nano-wire grid structure in preparation of parameters under the same conditions. Two aspects were optimized to improve the performance of latter grating array structure.
机译:基于斯托克斯矢量的铝纳米线网格结构在极化应用技术中起着重要作用。在本文中,我们介绍了使用EBL(电子束光刻)和ICP-RIE(感应耦合等离子体反应离子刻蚀)在单向结构和四向结构中制造铝纳米线栅的方法。根据可见光偏振的要求,将光栅的周期设计为200nm。通过实验测量和仿真分析,在相同条件下制备参数时,单向纳米线栅结构的消光比高于多向纳米线栅结构的消光比。从两个方面进行了优化,以提高后一种光栅阵列结构的性能。

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