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INVESTIGATION OF PEELING BEHAVIOR OF UV CURABLE PRESSURE SENSITIVE ADHESIVE FOR BUMP-WAFER

机译:紫外光固化压敏胶粘剂剥离行为的研究

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In this study, the peeling process of UV-curable pressure sensitive adhesive tape from bump wafer is investigated through the use of finite element analysis, observation of high speed video, and actual wafer back-grinding process testing. In our experiment, a large deformation of adhesive is observed at the edge of bottom of bump, appearing on the side of the bump opposite tape-peeling direction when observed with high speed microscope video. The largely deformed adhesive creates a string shaped elongation. The adhesive residue is caused by the fracture of the adhesive string. We investigated how to generate the adhesive string in the tape-peeling process through the use of finite element analysis. In this analysis, a cohesive element is introduced into the adhesive layer. The analytical result shows the adhesive string at the same position of experiment and the stress distribution is different between the string part and the other area of adhesive. The influence of peeling angle and bump size is also investigated by the same finite element model. As a result, higher peeling angle and smaller bump sizes shows a shorter adhesive string, which lowers the risk of adhesive residue.
机译:在这项研究中,通过使用有限元分析,高速视频观察以及实际的晶片背面研磨工艺测试,研究了UV固化压敏胶带从凸点晶片上的剥离过程。在我们的实验中,当用高速显微镜视频观察时,在凸块底部的边缘观察到粘合剂的大变形,出现在与胶带剥离方向相反的凸块一侧。变形很大的粘合剂产生线状伸长。残留的胶粘剂是由胶粘带断裂引起的。我们研究了如何通过使用有限元分析在胶带剥离过程中生成胶带。在该分析中,将粘合元件引入粘合层中。分析结果表明,胶粘绳处于相同的实验位置,且胶粘绳部分与其他区域之间的应力分布不同。同样的有限元模型也研究了剥离角和凸块尺寸的影响。结果,较高的剥离角和较小的凸块尺寸表示较短的胶粘带,这降低了胶粘剂残留的风险。

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