High throughput, parallel Scanning Probe microscope for nanometrology and nanopatterning applications

摘要

Scanning Probe microscope (SPM) is an important nanoinstrument for several applications such as bio-research, metrology, inspection and nanopatterning. Single SPM is associated with relatively slow rate of scanning and low throughput measurement, thus not being suitable for scanning large samples such as semiconductor wafers and photolithography masks. Over the last few years we have developed a parallel high throughput SPM. This has been done by miniaturizing the SPM systems and operating many of them simultaneously. Each miniaturized SPM can be operated independently. The parallel SPM also allows the measurement of several physical parameters simultaneously; while one instrument measures nano-scale topography, another instrument can measure mechanical, electrical or thermal properties, making it a Lab-on-an-Instrument. Recently in collaboration with SwissLitho AG, thermal scanning probe lithography has also been integrated into the miniaturized SPM. This enables the fabrication of nanostructures with one or more miniaturized SPM. Moreover, an automated cantilever exchange and optical alignment system is also developed. Various types of SPM cantilevers can be exchanged in 6 seconds with an accuracy better than 2 μm. The exchange and alignment unit is miniaturized to allow for integration in the parallel SPM. Ten thousand continuous exchange and alignment cycles were performed without failure. The proof of principle (PoP) of such a mechatronics instrument will be presented in this talk. This instrument provides new research opportunities in the nanometrology and nanopatterning of wafers and nanolithography masks by enabling real die-to-die and wafer-level measurements and in cell biology by measuring the nano-scale properties of a large number of cells.