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Crystallinity study of Si single crystal stripe on bended glass substrate fabricated by micro-chevron laser beam scanning method

机译:微V型激光束扫描法在弯曲玻璃基板上制备Si单晶条的结晶度研究

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Si single crystal stripe on bended glass substrate was fabricated by micro-chevron laser beam scanning method. The single crystal stripe had a dimension of about 6 μm in width and several hundreds of microns in length. The crystal quality was evaluated by EBSD, to reveal that the crystal orientation rotated about the transverse direction in forward direction, and only Σ3 and Σ9 coincidence site lattice (CSL) twins transvers the single crystal stripe.
机译:采用微V形激光束扫描法在弯曲玻璃基板上制备了Si单晶条。单晶条的宽度尺寸为约6μm,长度为几百微米。通过EBSD评估晶体质量,发现晶体取向沿横向沿正向旋转,并且只有Σ3和Σ9重合位点晶格(CSL)孪晶横穿了单晶条带。

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