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1×- to 2×-nm MTJ switching at sub-3 ns pulses with compatible current in sub-20 nm CMOS for high performance embedded STT-MRAM

机译:在亚3 ns脉冲下进行1×到2×nm的MTJ开关,并在20 nm以下的CMOS中兼容电流,用于高性能嵌入式STT-MRAM

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Magnetization switching was confirmed for sub-3-ns pulses below 100 μA in pMTJs down to 16 nm in diameter. The MR ratio exceeded 150%, satisfying requirements for fast read conditions. Using sub-30-nm MTJs, write-error rates of up to an order of -6 (10) were demonstrated. Read and write current margins, which were important device designs, were sufficiently large to avoid read disturbances. Moreover, 1×- to 2×-nm MTJs had sufficient data retention for level-2 or level-3 cache requirements. Furthermore, the MTJ resistance remained stable after 10 write events. We believe these p-MTJs are potentially available for cache memory in sub-20-nm CMOS and reduce power consumption and while increasing cache capacity.
机译:在直径小于16 nm的pMTJ中,对于低于100μA的亚3-ns脉冲,已确认进行磁化转换。 MR率超过150%,满足快速读取条件的要求。使用30纳米以下的MTJ,演示了高达-6(10)数量级的写入错误率。读取和写入电流裕度(这是重要的器件设计)足够大,可以避免读取干扰。此外,1×到2×nm的MTJ具有足够的数据保留能力,可以满足2级或3级高速缓存的要求。此外,经过10次写事件后,MTJ电阻保持稳定。我们认为,这些p-MTJ可能可用于20纳米以下CMOS中的高速缓存,并可以降低功耗并增加高速缓存容量。

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