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Uniformity of LED light illumination in application to direct imaging lithography

机译:LED光照明的均匀性在直接成像光刻中的应用

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Direct imaging has widely applied in lithography for a long time because of its simplicity and easy-maintenance. Although this method has limitation of lithography resolution, it is still adopted in industries. Uniformity of UV irradiance for a designed area is an important requirement. While mercury lamps were used as the light source in the early stage, LEDs have drawn a lot of attention for consideration from several aspects. Although LED has better and better performance, arrays of LEDs are required to obtain desired irradiance because of limitation of brightness for a single LED. Several effects are considered that affect the uniformity of UV irradiance such as alignment of optics, temperature of each LED, performance of each LED due to production uniformity, and pointing of LED module. Effects of these factors are considered to study the uniformity of LED Light Illumination. Numerical analysis is performed by assuming a serious of control factors to have a better understanding of each factor.
机译:由于直接成像的简单性和易维护性,它在光刻技术中已广泛使用了很长一段时间。尽管该方法具有光刻分辨率的限制,但仍在工业中采用。对于设计区域,紫外线照射的均匀性是重要的要求。尽管汞灯在早期被用作光源,但是LED从多个方面引起了人们的广泛关注。尽管LED具有越来越好的性能,但是由于单个LED的亮度限制,需要LED阵列来获得期望的辐照度。考虑了几种影响UV辐照度均匀性的效应,例如光学器件的对准,每个LED的温度,由于生产均匀性而导致的每个LED的性能以及LED模块的指向。考虑这些因素的影响,以研究LED照明的均匀性。通过假设严重的控制因素来进行数值分析,以更好地了解每个因素。

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