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Recent progress on high-efficiency CMOS and SiGe RF power amplifier design

机译:高效CMOS和SiGe射频功率放大器设计的最新进展

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The majority of the world's RF wireless power amplifiers (PA) products are still designed in III-V semiconductors today. However, by taking advantage of nm silicon devices and novel RF system-on-a-chip (SoC) design techniques, several groups have recently reported highly-competitive silicon RF PAs in both CMOS and SiGe BiCMOS technologies with performance rivaling those of the III-V RF PAs. We will, therefore, present an up-to-date review on recent design trends of silicon-based PAs, with the focus on high-efficient broadband wireless and 5G PA design.
机译:当今,全球大多数RF无线功率放大器(PA)产品仍采用III-V半导体设计。但是,通过利用纳米硅器件和新颖的RF片上系统(SoC)设计技术,最近有几个小组报告了在CMOS和SiGe BiCMOS技术中具有高度竞争力的硅RF PA,其性能可与III器件相媲美。 -V RF PA。因此,我们将对基于硅的功率放大器的最新设计趋势进行最新回顾,重点是高效宽带无线和5G PA设计。

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