首页> 外文会议>IEEE International Electron Devices Meeting >4Gbit density STT-MRAM using perpendicular MTJ realized with compact cell structure
【24h】

4Gbit density STT-MRAM using perpendicular MTJ realized with compact cell structure

机译:采用紧凑型单元结构的采用垂直MTJ的4Gbit密度STT-MRAM

获取原文

摘要

For the first time, 4Gbit density STT-MRAM using perpendicular MTJ in compact cell was successfully demonstrated through the tight distributions for resistance and magnetic properties. This paper includes the results regarding parasitic resistance control process, MTJ process, and MTJ stack engineering. Both of successful 4Gb read and write operations were performed with high TMR, low Ic. This result will brighten the prospect of high-density STT-MRAM.
机译:首次通过紧密的电阻和磁性能分布成功地证明了在紧凑型单元中使用垂直MTJ的4Gbit密度STT-MRAM。本文包括有关寄生电阻控制过程,MTJ过程和MTJ堆栈工程的结果。成功的4Gb读写操作均以高TMR,低Ic进行。这一结果将拓宽高密度STT-MRAM的前景。

著录项

相似文献

  • 外文文献
  • 中文文献
  • 专利
获取原文

客服邮箱:kefu@zhangqiaokeyan.com

京公网安备:11010802029741号 ICP备案号:京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有
  • 客服微信

  • 服务号