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Prospects of Two-dimensional Material-based Field-Effect Transistors for Analog/RF Applications

机译:基于二维材料的场效应晶体管的前景,用于模拟/射频应用

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With the recent experimental advancement in the fabrication of short channel two-dimensional material based field-effect transistors (2DM-FETs), it becomes essential to critically understand their performance for digital and analog applications. Although extensive research efforts in 2DM-FETs have demonstrated excellent switching performance for ultra-scale devices, there still exists an intensive demand to understand the RF and linearity performance for future high-frequency applications. Therefore, in this work, the RF and linearity performance metrics for two most emerging 2DMs, such as MoS2 and black phosphorous (BP), based FETs are examined and compared with ultra thin-body Si-MOSFET. This performance analysis is done using a self-developed quantum transport simulation based on self-consistent solutions of non-equilibrium Green's function approach and 2-D Poisson's equation. The results exhibit that monolayer BP-FET has a higher ON current and cutoff frequency, but degraded linearity figure-of-merits, such as higher order voltage intercepts and third order intermodulation distortions, could limit their use in radio-frequency integrated circuits. The Si-MOSFET has exhibited enhanced RF linearity and distortion performance metrics over 2DM-FETs and hence, promise excellent reliability for analog/RF circuit and sensor applications.
机译:随着近期在短通道二维材料的场效应晶体管(2DM-FET)的制造中的实验进步,它变得重要地理解它们对数字和模拟应用的性能。虽然2DM-FET中的广泛研究工作已经表现出优异的超级设备的开关性能,但仍然存在密集需求,了解未来的高频应用的RF和线性性能。因此,在这项工作中,射频和线性性能度量的两个最新兴2DMS(如MOS) 2 和黑色磷(BP),基于基于FET的FET,并与超薄体Si-MOSFET进行比较。这种性能分析是使用基于非平衡绿色功能方法和2-D泊松方程的自我一致的解决方案的自我开发的量子传输模拟来完成的。结果表明,单层BP-FET在电流和截止频率上具有更高的频率,但诸如更高阶电压截距和第三阶互调失真的典型值下降的线性度可能限制它们在射频集成电路中的使用。 Si-MOSFET在2DM-FET上表现出增强的RF线性和失真性能指标,因此,对于模拟/射频电路和传感器应用承诺优异的可靠性。

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