Relationship between Information and Energy Carried by Extreme-Ultraviolet Photons: Consideration from the Viewpoint of Sensitivity Enhancement

摘要

The role of photons in lithography is the transfer of information and energy. The resist patterns are fabricated in accordance with the information carried by photons. The energy is used to induce the chemical reactions required for the solubility change of the resist. In this study, the relationship between information and energy carried by photons was investigated. Which of the factors limits the resist performance depends on the relationship between requirement and resist performance. In the design of next generation resist materials, it is important to determine which is insufficient, information or energy.