首页> 外文会议>Conference on alternative lithographic technologies VII >Directed self-assembly of diblock copolymers in cylindrical confinement: effect of underfilling and air-polymer interactions on configurations
【24h】

Directed self-assembly of diblock copolymers in cylindrical confinement: effect of underfilling and air-polymer interactions on configurations

机译:圆柱形封闭中二嵌段共聚物的定向自组装:底部填充和空气-聚合物相互作用对构型的影响

获取原文

摘要

Directed self-assembly (DSA) of block copolymers has attracted attention for its use as a simple, cost-effective patterning tool for creating vertical interconnect access (VIA) channels in nanoelectronic devices.1'2 This technique supplements existing lithographic technologies to allow for the creation of high-resolution cylindrical holes whose diameter and placement can be precisely controlled. In this study, we use self-consistent field theory (SCFT) simulations to investigate the equilibrium configurations of under-filled DSA systems with air-polymer interactions. We report on a series of SCFT simulations of our three species (PMMA-b-PS diblock and air) model in cylindrical confinement to explore the role of template diameter, under-fill fraction (i.e. volume fraction of air), air-polymer surface interaction and polymer-side wall/substrate interactions on equilibrium morphologies in an under-filled template with a free top surface. We identify parameters and system configurations where a meniscus appears and explore cases with PMMA-attractive, PS-attractive, and all-neutral walls to understand the effects of wall properties on meniscus geometry and DSA morphology. An important outcome is an understanding of the parameters that control the contact angle of the meniscus with the wall, as it is one of the simplest quantitative measures of the meniscus shape. Ultimately, we seek to identify DSA formulations, templates, and surface treatments with predictable central cylinder diameter and a shallow contact angle, as these factors would facilitate broad process windows and ease of manufacturing.
机译:嵌段共聚物的定向自组装(DSA)作为一种简单,经济高效的构图工具,在纳米电子器件中创建垂直互连通道(VIA)通道而引起了人们的关注。1'2该技术是对现有光刻技术的补充,可实现以下目的:创建了可以精确控制直径和位置的高分辨率圆柱孔。在这项研究中,我们使用自洽场论(SCFT)模拟来研究具有空气-聚合物相互作用的欠填充DSA系统的平衡构型。我们报告了在圆柱约束中对我们的三种物种(PMMA-b-PS二嵌段和空气)模型进行的一系列SCFT模拟,以探索模板直径,底部填充分数(即空气的体积分数),空气聚合物表面的作用带有自由顶表面的填充不足模板中的平衡形态上的相互作用和聚合物-侧壁/底物之间的相互作用。我们确定出现弯月面的参数和系统配置,并探索具有PMMA吸引力,PS吸引力和全中性壁的案例,以了解壁特性对弯月面几何形状和DSA形态的影响。一个重要的结果是理解控制弯月面与壁的接触角的参数,因为它是弯月面形状的最简单的定量度量之一。最终,我们寻求确定具有可预测的中心圆柱直径和浅接触角的DSA配方,模板和表面处理方法,因为这些因素将有利于宽阔的工艺窗口并易于制造。

著录项

相似文献

  • 外文文献
  • 中文文献
  • 专利
获取原文

客服邮箱:kefu@zhangqiaokeyan.com

京公网安备:11010802029741号 ICP备案号:京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有
  • 客服微信

  • 服务号