193i lithography for contact doubling with grapho-epitaxy DSA: A simulation study

摘要

Directed self-assembly (DSA) of block copolymers (BCP) is a promising candidate for alternative micro lithography due to its cost effectiveness, its ability to reduce critical dimension and to increase pattern density. For contact layer patterning, grapho-epitaxy combined with cylindrical BCP is a good candidate. While contact shrink has already been a well-controlled process, contact multiplication is still undergoing further studies. In this paper we propose to study the impact of 193i scanner variations on BCP overlay for contact doubling.