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Sol-gel imprint lithography for guided mode resonance structures

机译：导模共振结构的溶胶-凝胶压印光刻

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摘要

A sol-gel based imprint lithography process has been developed to fabricate guided-mode resonance (GMR) structures. The inexpensive process offers a rapid means to create sub-micron grating waveguide structures over large surface areas. Both one-dimensional and two-dimensional GMR devices have been successfully fabricated and characterized.

机译：已经开发了基于溶胶-凝胶的压印光刻工艺，以制造导模共振（GMR）结构。廉价的工艺提供了一种在大表面积上创建亚微米光栅波导结构的快速方法。一维和二维GMR设备均已成功制造和表征。

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《IEEE Photonics Conference》|2015年|367-368|共2页
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Yin Huang; Longju Liu; Chng Benjamin; Meng Lu;
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diffraction gratings; optical fabrication; optical testing; optical waveguides; photolithography; sol-gel processing; guided mode resonance structure fabrication; one-dimensional GMR devices; sol-gel based imprint lithography process; sub-micron grating waveguide structures; two-dimensional GMR devices; Dielectrics; Glass; Gratings; Optical device fabrication; Optical waveguides;

机译：衍射光栅;光学制造;光学测试;光波导;光刻;溶胶-凝胶加工;导模共振结构制造;一维GMR器件;基于溶胶-凝胶的压印光刻工艺;亚微米光栅波导结构;二维GMR器件;电介质;玻璃;光栅;光学器件制造;光学波导;

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专利

1. One-step sol-gel imprint lithography for guided-mode resonance structures [J] . Huang Yin, Liu Longju, Johnson Michael, Nanotechnology . 2016,第9期

机译：导模共振结构的一步式溶胶-凝胶压印光刻
2. Fabrication of hierarchically structured titania thin films via combining nano-imprint lithography with block copolymer assisted sol-gel templating [J] . Martin A. Niedermeier, Gregory Tainter, Benedikt Weiler Journal of Materials Chemistry, A. Materials for energy and sustainability . 2013,第27期

机译：通过将纳米压印光刻技术与嵌段共聚物辅助的溶胶-凝胶模板相结合来制备分层结构的二氧化钛薄膜
3. Fabrication of dual brightness enhancement structures on light guide plates using UV roll-to-plate imprinting lithography [J] . Yang J.-C., Huang C.-C. Optik: Zeitschrift fur Licht- und Elektronenoptik: = Journal for Light-and Electronoptic . 2013,第18期

机译：使用UV卷对板压印光刻技术在导光板上制造双增亮结构
4. Sol-gel imprint lithography for guided mode resonance structures [C] . Yin Huang, Longju Liu, Chng Benjamin, IEEE Photonics Conference . 2015

机译：用于导向模式共振结构的溶胶 - 凝胶压印光刻
5. Design of Submicron Structured Guided-Mode-Resonance Near-Infrared Polarizer [D] . Zaman, Marzia. 2020

机译：亚微米结构引导模式共振近红外偏振器的设计
6. High Quality 3D Photonics using Nano Imprint Lithography of Fast Sol-gel Materials [O] . Ofer Bar-On, Philipp Brenner, Tobias Siegle, -1

机译：使用快速溶胶-凝胶材料的纳米压印光刻技术的高质量3D光子学
7. X-ray verification of sol-gel resist shrinkage in substrate-conformal imprint lithography for a replicated blazed reflection grating [O] . Jake A. McCoy, Marc A. Verschuuren, Drew M. Miles, 2020

机译：用于复制的闪光反射光栅的基板 - 保形印记光刻中溶胶 - 凝胶抗蚀剂的X射线验证
8. Sol-Gel Kinetics: Sup 29 SI NMR(Nuclear Magnetic Resonance) and a Statistical Reaction Model. [R] . Assink, R. A., Kay, B. D. 1988

机译：溶胶 - 凝胶动力学：sup 29 sI NmR（核磁共振）和统计反应模型。

Sol-gel imprint lithography for guided mode resonance structures

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