A Novel System for Slurry Recycling and Waste Water Permeation

摘要

Traditionally, CMP (chemical mechanical planarization) slurry waste requires significant amount of works including pH neutralization, solid precipitation and toxic separation before discharged into environment. Due to the stringent process control in 1C manufacturing, the slurries typically cannot be reused, and it caused significant burden to the IC fabs ˇfacilities. CMC has successfully developed a novel slurry recycling system which has been implemented in mass production IC fabs over 3 years.. The slurry waste is properly processed to collect both abrasives and permeated water. The abrasive can be further adjusted for continuous polishing usage while the permeated water will be feedback for DI water source. This system has been optimized for reliable slurryˇs physical properties and well verified with stable polishing performance and no impact on polish defectivity.