Scalable production of sub μm functional structures made of non CMOS compatible materials on glass

摘要

Biophotonic and Life Science applications often require non-CMOS compatible materials to be patterned with sub μm resolution. Whilst the mass production of sub μm patterns is well established in the semiconductor industry, semiconductor fabs are limited to using CMOS compatible materials. IMT of Switzerland has implemented a fully automated manufacturing line that allows cost effective mass manufacturing of consumables for biophotonics in substrate materials like D263 glass or fused silica and layer/coating materials like Cr, SiO_2, Cr_2O_5, Nb_2O_5, Ta_2O_5 and with some restrictions even gold with sub-um patterns. The applied processes (lift-off and RIE) offer a high degree of freedom in the design of the consumable.