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A dual-axis MEMS inertial sensor using multi-layered high-density metal for an arrayed CMOS-MEMS accelerometer

机译:使用多层高密度金属的双轴MEMS惯性传感器,用于阵列CMOS-MEMS加速度计

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This paper reports a novel dual-axis MEMS inertial sensor that utilizes multi-layered electroplated gold. All the MEMS structures are made by gold electroplating that is used as post-CMOS process. Due to the high density of gold, the Brownian noise on the proof mass becomes lower than those made of other materials in the same size. The miniaturized MEMS accelerometer can be integrated in an arrayed CMOS-MEMS accelerometer to detect a broad range of acceleration on a single sensor chip.
机译:本文报道了一种采用多层电镀金的新型双轴MEMS惯性传感器。所有的MEMS结构都是通过电镀金制成的,并被用作后CMOS工艺。由于金的密度高,所以在质量块上的布朗噪声变得比由相同尺寸的其他材料制成的布朗噪声要低。微型MEMS加速度计可以集成在阵列CMOS-MEMS加速度计中,以检测单个传感器芯片上的广泛加速度。

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