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DYNAMICS OF THE LIQUID MICROLAYER UNDERNEATH A VAPOR BUBBLE GROWING AT A HEATED WALL

机译:加热壁上蒸气起泡下的液体微层动力学

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Evaporation of the liquid microlayer developing underneath a bubble in the initial (inertia controlled) phase of its growth can be a significant vapor source in the later (heat-diffusion controlled) phase of bubble growth. In the literature, representation of this microlayer is typically limited to a very short (order of microns) region near the apparent Triple Phase Line (TPL) between the bubble and the wall. However, experimental observations show that the microlayer may actually extend hundreds of microns beyond the TPL region. Guided by this observation, we develop a simple model to predict the time evolution of the extended microlayer, and the associated corresponding evaporation rate and heat flux underneath a bubble. The model is derived as a special case of the complete governing equations, which account for the complicated effects of disjoining pressure, capillarity, vapor recoil and interfacial resistance. The predictions of the model are in reasonable quantitative agreement with the experimentally observed behavior of the microlayer.
机译:在气泡生长的初始(惯性控制)阶段中在气泡之下形成的液体微层的蒸发可以是气泡生长的后期(热扩散控制)阶段中的重要蒸气源。在文献中,该微层的表示通常限于气泡和壁之间的表观三相线(TPL)附近的非常短的区域(微米级)。然而,实验观察表明,微层实际上可以延伸超过TPL区域数百微米。以此观察为指导,我们开发了一个简单的模型来预测扩展微层的时间演变以及气泡下方的相关蒸发速率和热通量。该模型是作为完整控制方程式的特例导出的,该方程式解释了分离压力,毛细作用,蒸气反冲力和界面阻力的复杂影响。模型的预测与微层的实验观察到的行为在合理的数量上吻合。

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