A Study of Subwavelength Grating Waveguide and Coupling Structures for 0.18 μm CMOS Process

摘要

Subwavelength grating (SWG) structures can greatly improve the design flexibility of silicon photonic integrated circuits. Most SWG structures reported in the literature so far are fabricated with electron beam lithography, limiting their use in mass production. In this work, a study has been carried out for the SWG waveguide and coupling structures that are compatible with 0.18 μm CMOS process. The optical propagation in this SWG waveguide has been analyzed, and the loss of coupling structures between solid silicon waveguide and SWG waveguide have been studied through simulation and measurement. The overall results show a potential of the design and fabrication of SWG waveguides with 0.18 μm CMOS process.