首页> 外文会议>International Conference on Materials for Renewable Energy and Environment >A novel square silicon nanohole structure: Fabrication and antireflective property
【24h】

A novel square silicon nanohole structure: Fabrication and antireflective property

机译:新型方形硅纳米孔结构:制备和抗反射性能

获取原文

摘要

In this paper, a novel square silicon nanoholes light-trapping structure of solar cells was prepared by improved electroless etching method, which is different from the irregular nanoholes and round nanoholes reported earlier by corrosion method in the silicon substrate. We analyzed the formation process of this structure and found that the concentration of nitric acid silver in the solution can determine the formation of the square nanoholes. Moreover, we demonstrated that the longer etching time, the deeper the silicon nanoholes. This square silicon nanohole arrays could suppress the reflection drastically over a wide spectral band width ranging from 300 to 1100 nm.
机译:本文采用改进的无电蚀刻方法制备了一种新的方形硅纳米孔的光捕获结构,其通过改进的化学蚀刻方法制备,其与硅衬底中的腐蚀方法提前提前报道的不规则纳米孔和圆形纳米孔。我们分析了这种结构的形成过程,发现溶液中硝酸银的浓度可以确定方形纳米孔的形成。而且,我们证明了较长的蚀刻时间,硅纳米孔更深。该方形硅纳米孔阵列可以在宽的光谱带宽范围内抑制从300至1100nm的宽光谱带宽抑制反射。

著录项

相似文献

  • 外文文献
  • 中文文献
  • 专利
获取原文

客服邮箱:kefu@zhangqiaokeyan.com

京公网安备:11010802029741号 ICP备案号:京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有
  • 客服微信

  • 服务号